On May 14, 2025, Academician Sun Shigang of the Chinese Academy of Sciences (CAS), who is also a professor at the College of Chemistry and Chemical Engineering of Xiamen University, together with the team from the National Engineering Research Center for Advanced Electronic Chemicals (hereinafter referred to as the "Engineering Center"), visited the Shanghai Key Laboratory of Advanced Materials for IC Manufacturing Processes of Sinyang (hereinafter referred to as the "Key Laboratory"). The two sides conducted in-depth exchanges on topics such as scientific research cooperation, technological breakthroughs, and talent cultivation in the field of integrated circuit (IC) materials. This visit aimed to promote cross-regional industry-university-research collaborative innovation and support the independent and controllable development of China’s key IC material technologies.

At the forum, Liu En’en, Deputy Director of the Engineering Center, systematically introduced the Center’s R&D platforms, including the progress of collaborative R&D on electronic chemicals related to electronic electroplating and wet electronic chemicals, as well as the systematic layout of materials, equipment, verification, and methodologies for high-end electronic chemicals. Sun Hongqi, Director of the Technology Center of Shanghai Sinyang, reported on the R&D project progress of the Key Laboratory and its external cooperation and exchange activities. The two sides carried out constructive discussions on the current development trends of key material technologies, technical bottlenecks, and the role of collaborative research in supporting industrial development in China’s IC key process materials sector.

Accompanied by Dr. Wang Su, Director of the Key Laboratory, Academician Sun’s team conducted an on-site inspection of the Laboratory’s advanced R&D platforms, and gained a detailed understanding of its innovative achievements in such areas as electroplating, cleaning, photoresist, and CMP polishing materials for IC manufacturing. Academician Sun highly recognized the achievements made by the Key Laboratory in integrating industry with research and industrial application. He noted that both the down-to-earth R&D and industrialization application of the chip copper interconnection plating solution and additives project, which has been honed over more than a decade, and the R&D investment and innovation in the photoresist field without pursuing short-term commercial interests, serve as exemplary models worthy of learning for both the academic and industrial communities.

Dr. Wang Su stated that the achievements of Academician Sun’s team in the research of material micro-mechanisms and computational chemistry have provided important insights for the new material R&D of the Key Laboratory. He expressed the expectation that through future cooperation, the two sides will accelerate the application and transformation of the Laboratory’s research achievements, injecting new impetus into the independent and controllable development of China’s key IC material technologies.